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  • KJ-T1200 PECVD System


    Continuous Temp:

    Chamber/Tube size:


    Brief Introduction:  
        KJ-T1200 PECVD is a is PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system which consists of 500W RF power supply, splitable tube furnace with 200mm diameter quartz tube, vacuum pump and three channels mass flow meters gas flowing system. It can mix 1-3 types of gases for CVD or diffusion. 
    Technical Parameter:
    Model KJ-T1200
    Part I: Standard Parts
    Plasma RF Power Supply
    Output Power 5 -500W adjustable with ± 1% stability
    RF frequency 13.56 MHz ±0.005% stability
    Reflection Power 200W max.
    Matching Automatic
    RF Output Port 50 Ω, N-type, female
    Noise <50 dB.
    Cooling Air cooling.
    Tube Furnace
    Display LED
    Chamber Split type and upper part can be opened
    Continuous Woking Temp. ≤1100℃
    Heating Rate Suggestion: 0~10℃/min (max. 20℃/min)
    Temperature Zone 500mm
    Heating Element Resistance wire with Mo
    Thermocouple K type
    Temperature Control Accuracy ±1℃
    Tube Size 200mm OD X Length 1600 mm
    Material: Quarz Tube
    Temperature Control PID automatic control via SCR power control
    Heating curves 30 steps programmable
    Vacuum Flange Stainless Steel vacuum flange with valve
    Power 380V, 50 Hz, three phases at max.20KW
    Vacuum Pump
    Rotary Vane Vacuum Pump
    Flow rate: 4L/S
    The rotary vane vacuum pump will be designed into a cart with wheel.
    Mass Flow Meters Three precision mass flow meters :
    MFC 1: Gas flow range from 0~100 sccm
    MFC 2: Gas flow range from 0~100 sccm
    MFC 3: Gas flow range from 0~100 sccm
    (or according to your requirement)
    One gas mixing tank is installed on bottom case with 3 stainless steel needle valves is installed on left side of bottom case to control 3 type gases mixing manually

    Digital Vacuum Gauge Pirani digital vacuum gauge

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