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Large diameter PECVD system
  • Large diameter PECVD system
  • Large diameter PECVD system
  • Large diameter PECVD system
  • Large diameter PECVD system
  • Large diameter PECVD system

    Model:KJ-T1200-S200-4ZH-PE

    Description:

    The large diameter PECVD system ionizes the gas containing the film constituent atoms by radio frequency to form a plasma locally. The plasma has a strong chemical activity and is easy to react to deposit the desired film on the substrate. This system is

    Product introduction: 
        The large-diameter PECVD system uses radio frequency to ionize the gas containing the film constituent atoms to form a plasma locally. The plasma has a strong chemical activity and is easy to react to deposit the desired film on the substrate. The system is extensive Used to deposit high-quality, SiO2 film, Si3N4 film, diamond film, hard film, optical film, carbon nanotube (CNT), graphene materials, etc.
    Technical Parameters:
    product name Large diameter PECVD system (CE certification)
    Slide rail tube furnace part
    Product number KJ-T1200-S200-4ZH-PE
    Furnace tube size Φ200mmX1200mm
    Furnace tube material Quartz tube
    Heating zone 400mm
    Operating temperature 1100°C
    Maximum temperature 1200°C
    Temperature control method K-type thermocouple
    way to control Touch screen control, you can adjust the angle of the temperature control screen according to actual use needs, making it more convenient to use
    Temperature control accuracy ±1℃
    Temperature control protection With over-temperature and burnout protection function
    Heating rate 0-20ºC/min, recommended 10ºC/min
    Heating element Molybdenum resistance wire
    Operating Voltage AC 220V single-phase 50HZ (circuit voltage users can choose to customize)
    Furnace material Alumina polycrystalline fiber
    Flange joint Standard configuration is equipped with two stainless steel vacuum flanges, mechanical pressure gauge and stainless steel globe valve have been installed
    Sealing system The furnace tube and flange are extruded and sealed with a silica gel O-ring, which is convenient to remove and can be removed repeatedly, and has good air tightness.
    case Stainless steel housing
    Optional Auxiliary cooling fan
                         Vacuum system part
    name Vacuum system
    The main parameters 1. Using high vacuum molecular pump set, the ultimate vacuum can reach 10-3pa
    2. KF25 quick connection, stainless steel bellows, manual baffle valve and flange, vacuum pump connection;
    3. Digital vacuum display, its measurement range is 5 ×10-5-1500mbar, high measurement accuracy
    Pneumatic system part
    name Four-way mass flow meter
    The main parameters Four-channel precision mass flow meter: touch screen control, digital display, automatic control. Flow range Flow range:
    1. MFC 1-MFC4: 0-1000sccm adjustable
    2. A gas mixing tank
    3.4 stainless steel needle valves are installed on the left side of the gas supply system, which can manually control 4 kinds of gases;
    4. Air inlet and outlet: 3 In and out
    flow control: manual rotary adjustment
    connection mode: double ferrule connection
    Plasma power supply part
    name 500W plasma power supply
    Power range 0-500W (continuously adjustable)
    working frequency 13.56MHZ+0.005%
    Operating mode Continuous output
    RF output impedance interface N-type, female (50Ω)
    Power stability ≤2W
    Maximum reflected power 70W
    Power protection settings DC over-current protection, power amplifier over-temperature protection, reflected power protection
    Supply voltage/frequency Single-phase AC (187V-253V) 50-60HZ
    cooling method Air-cooled
    Certification ISO certification, CE certification
    After-sales service One year warranty and lifetime warranty (consumables: high temperature sealing ring, furnace tube, heating element, etc. are not covered by the warranty)

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    Tel Number

    181-3719-5600

    Email

    web@kejiafurnace.com

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