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Whatapp:
Address:Room 1505, Building 9, No. 26 Dongqing Street, Zhengzhou High-tech Industrial Development Zone
Tel Number
180-3717-8440
Product Introduction:
The high vacuum RTP annealing furnace is a rapid heat treatment tubular furnace with a relatively high vacuum degree. It is equipped with a quartz cavity and a vacuum flange. It is heated by a halogen lamp. The heating speed can reach 50℃/second. It is automatically controlled by PID. Designed for annealing semiconductor or solar cell substrates.
This rapid heat treatment tubular furnace which not only has a very fast heating rate, but also directly moves the sample to room temperature after the sintering process is completed to achieve the physical state rapid cooling down. The equipment adopts the gas path structure of the inner tube inlet and the outer tube outlet, so that the reaction atmosphere can fully and evenly contact the processed samples.
Applications:
It is specially designed for the annealing of semiconductor or solar cell substrates. It is a common equipment for growing large-size two-dimensional graphene by CVD.
