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Address:Room 1505, Building 9, No. 26 Dongqing Street, Zhengzhou High-tech Industrial Development Zone
Tel Number
180-3717-8440
Product description:
Kejia high vacuum PECVD equipment is composed of tube furnace, vacuum system, gas supply system, radio frequency power supply system, etc. The system is mainly used in the growth of metal thin films, ceramic thin films, composite thin films, graphene, etc. The PECVD system has the advantages of high film deposition rate, good uniformity, high consistency and stability.
Main features of PECVD system:
1. Change the gas in the quartz vacuum chamber to an ion state through the radio frequency power supply.
2. PECVD requires a lower temperature than ordinary CVD for chemical vapor deposition.
3. PECVD has higher chemical vapor deposition rate, better uniformity, consistency and stability than ordinary CVD.
4. Widely used in the growth of various thin films, such as SiOx, SiNx, SiOxNy and amorphous silicon (a-Si:H).
Main technical parameters of the equipment:
Kejia high vacuum PECVD equipment is composed of tube furnace, vacuum system, gas supply system, radio frequency power supply system, etc. The system is mainly used in the growth of metal thin films, ceramic thin films, composite thin films, graphene, etc. The PECVD system has the advantages of high film deposition rate, good uniformity, high consistency and stability.
Main features of PECVD system:
1. Change the gas in the quartz vacuum chamber to an ion state through the radio frequency power supply.
2. PECVD requires a lower temperature than ordinary CVD for chemical vapor deposition.
3. PECVD has higher chemical vapor deposition rate, better uniformity, consistency and stability than ordinary CVD.
4. Widely used in the growth of various thin films, such as SiOx, SiNx, SiOxNy and amorphous silicon (a-Si:H).
Main technical parameters of the equipment:
| Product name | High vacuum PECVD system |
| Model number | KJ-PECVD |
| Part I Slide Rail Tube Furnace Part | |
| Furnace tube size | Φ25mmX1600mm (final length depends on final design.) |
| Furnace tube material | Quartz tube |
| Heating zone | 200+200mm (dual zone) Customizable |
| Operating temperature | ≤1100°C |
| Maximum temperature | 1200°C for limiting |
| Temperature control method | N-type thermocouple |
| way to control | Touch screen control, with independent rocker arm, you can adjust the angle of the temperature control screen according to actual needs, making it more convenient to use |
| Temperature control accuracy | ±1℃ |
| Temperature control protection | With over-temperature and burnout protection function |
| Heating rate | recommended ≤10ºC/min, max. 20ºC/min |
| Heating element | resistance wire |
| Furnace material | Alumina polycrystalline fiber |
| Furnace structure | The furnace body has a slide rail, which can realize rapid heating and cooling |
| Vacuum Flange | Standard configuration is equipped with two stainless steel vacuum flanges, mechanical pressure gauge and stainless steel globe valve have been installed |
| Sealing system | The furnace tube and flange are extruded and sealed with a silica gel O-ring, which is convenient to remove and can be removed repeatedly, and has good air tightness. |
| Case | Carbon Steel or Stainless steel housing |
| Optional | Auxiliary cooling fan |
| Part II Vacuum System Part | |
| name | Vacuum system |
| The main parameters | 1. Using Chinese brand high vacuum molecular pump set, the ultimate vacuum degree can reach 6.7x10-3pa (In empty and cold state) 2. KF25 quick connection, stainless steel bellows, manual flapper valve and flange, vacuum pump connection; 3. Digital vacuum display, its measuring range is 5×10-5-1500mbar, with high measuring accuracy  |
| Part III Gas supply system part | |
| Name | Four-way mass flow meter |
| The main parameters | Four-channel precision mass flow meter: touch screen control, digital display, automatic control.  1.Flow range: MFC 1-MFC3: 0-1000sccm adjustableMFC1: CH4 0-10sccm MFC2: H2 0-200sccm MFC3:0-200sccm MFC4: 0-300sccm Control accuracy: +-1.5% F.S. 2. A mixing tank 3. 4 stainless steel needle valves are installed on the left side of the gas supply system, which can manually control 4 kinds of gases; 4. Air inlet and outlet: 4 in and 1 out Flow control: LCD Touch screen Note:Liquid or corrosion gas not supported. |
| Part IV Plasma power supply part | |
| Name | 500W plasma power supply |
| Power range | 0-500W (continuously adjustable) |
| working frequency | 13.56MHZ+0.005% |
| Operating mode | Continuous output |
| RF output impedance interface | N-type, female (50Ω) |
| Power stability | ≤2W |
| Maximum reflected power | 70W |
| Power protection settings | DC over current protection, power amplifier over temperature protection, reflected power protection |
| cooling method | Air cooling |
| After-sales service | One year warranty and lifetime warranty (consumables: high temperature sealing ring, furnace tube, heating element, etc. are not covered by the warranty) |
