High quality and large area graphene can be prepared by CVD (chemical vapor deposition), which has been widely used.
|Heating element||KTL resistance wire|
|Hot zone||3-8 zones optional|
|Max temperature||Room temperature-1200C continuous adjustable|
|Temperature control||Man-machine interface plus PLC control, 10-inch LCD screen control, digital industrial control instrument dual control, industrial intelligent temperature control instrument and software to achieve dual control, PID control|
|Paperless record||Built-in storage and recording process data, external USB interface, you can connect the computer to copy data with one click|
|Structure description||① The equipment can be opened by electric, and cooling system can be automatically controlled. A controlled cooling rate can be achieved.
② Equipped with a 2-way high-precision mass flow meter system at the feed end to accurately control the gas flow, which can realize the expansion and adjustment of the production process.
③The system adopts automatic technological process and sets the process with one-key operation. Reduce human factors, process reliability can reach 99.9%;
④Mechanical pump system: 1pa, additionally equipped with a fine-tuning system to ensure that graphene can be grown under stable negative pressure; a graphene film with a daily output of 200,000 square centimeters can be realized
|Chamber||Using internal temperature control and external temperature control to switch between each other to prevent the uneven temperature field caused by quartz refraction and scattering|
|Gas system||3-ways mass flow meter|
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