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LP/AP CVD system
  • LP/AP CVD system
  • LP/AP CVD system
  • LP/AP CVD system
  • LP/AP CVD system
  • LP/AP CVD system

    Model:

    Description:

    The equipment is used in the research industry of thin film preparation, semiconductors, power electronics and other materials, and is suitable for scientific research and teaching in research institutes, colleges and universities.

    Main application:
        The equipment is used in the research industry of thin film preparation, semiconductors, power electronics and other materials, and is suitable for scientific research and teaching in research institutes, colleges and universities.

    Specification:
    1. Working temperature: 300-1100°C
    2. Tube diameter size: φ60-300
    3. Gas flow meter:1-4 channels  Adopt domestic advanced MFC or float flowmeter
    4. Optional vacuum pump: optional and customizable;  (1. molecular vacuum pump system 2. rotary vane vacuum pump 3. diffusion vacuum pump system)
    5. Touch screen controller optional: 10-15inches
    6. Process automation can be realized
    7. Can realize automatic feeding and discharging
    8. Can be customized, welcome to contact us for more details.

    LP/AP CVD system

    Inquiry

    Please leave a message here. We will reply you in 24 hours.

    Relate Customer Case

    Tel Number

    180-3717-8440

    Email

    web@kejiafurnace.com

    FaceBook

    Zhengzhou/Kejia

    YouTuBe

    Zhengzhou/Kejia

    kejialiuyan