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  • RTP rapid annealing furnace

    Model:KJ-RTP1000-DZ

    Continuous Temp:

    Chamber/Tube size:

    Description:

    Product introduction:
      This customized RTP rapid annealing furnace is a RTP (rapid thermal processing) tube furnace, multi-channel proton flowmeter system and vacuum system, designed for semiconductor substrates and solar cells or other samples (up to 3" in size) Designed for annealing. This equipment is heated by infrared lamps, and the fastest heating rate is 50°C/sec. 30-stage precise temperature control, RS485 interface and control software can control the operation of the furnace through a computer and display the temperature curve.
    Technical parameters:

    product name

    Custom RTP system

    Part 1: Tube furnace

    product name

    Open RTP tube furnace with upper and lower temperature zones  

    temperature

    Up to 1000 degrees

    Controller

    LCD touch screen

    Furnace tube size

    Quartz tube outer diameter 80mm/inner diameter 72mm single side opening  

    Heating zone

    300mm  

    Furnace type

    Open

    Power supply

    Voltage: 380V; Frequency: 50 Hz; Three-phase

    Heating element

    Halogen heating  

    Heating rate

    30 C/sec

    Thermocouple

    K-type thermocouple measures the temperature of the material

    Temperature Controller

    30-segment high-precision digital programmable temperature controller

    Part Two Air Mixing System

    Range

    MFC1: Oxygen (O2) 0-200sccm

    MFC2: Argon (Ar) 0-200sccm

    The third part of the vacuum system

    Feiyue VDR-4 1L/S + dust filter supporting anti-corrosion digital vacuum gauge

     
    Products
    Inquiry

    Tel Number

    181-3719-5600

    Email

    web@kejiafurnace.com

    FaceBook

    Zhengzhou/Kejia

    YouTuBe

    Zhengzhou/Kejia

    kejialiuyan