Company Statement" Zhengzhou KJ Technology Co., Ltd. " belongs to the international business department of KJ Group. Starting today, the company will continue the international business contract signed or currently being performed by " Zhengzhou Kejia Furnace Co., Ltd. " See details >>
ALD-1200X is a 4" tube furnace combining with two channel ALD valves and one channel liquid vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film.
|· All parameters of ALD vapor puls time , and Gas flow are controlled by PLC via a 6" touch screen panel in a mobile cart
· Control Two ALD valves with puls duation time and cycling with mico-second precision
· Control For channels gas delivery with ±0.2%F.S via MFC
· Display vacuum pressure
· Other parameter upon request of customer
· Please click picture below to see control interface
|· Two ALD valves with pulse controller (min 10 ms duration )
· Capable of heating with thermal actuators
|· Automatic liquid vapor generator is included and connect to ALD valve
Dual Zone Split Tube furnace
|· Max 1100ºC for continuous heating
· Two programmable precision digital temperature controllers with 30 segments.
· Two separate controlled Heating Zones
· 200mm length for each heating zone
· 400mm total in heating length
· 250mm constant central temperature heating area if both zones were heated at the same temperature
· 500ºC max temperature difference between two zones with thermal blocks in between
· Input power: 208 – 240V AC input, single phase at max. 4KW
· Optional: ALD control system can be installed with a short tube furnace or rotation tube furnace as picture below
|Anti-corrosive Pressure Gauge
|· 3.8x10-5 to 1125 Torr measurement range
· Anti-corrosive, gas-type independent
· High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection
· Fast atmospheric detection eliminates waiting time and shortens process cycle
· Easy to exchange plug & play sensor element
· Click the picture to view detail spec.
|· 10E-2 Torr vacuum can be achieved inside processing tube
· Vacuum pump is not included , suggest you order a dry pump for CVD process by click picture below
More Bubbler Optional
|· Click picture below to order bubbler or evaporator for CVD, and below right for Constant temperature control module
· Could add Quartz Crystal and thermocouple to monitoring thin film thickness and temperature at extra cost
|· You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD and ALD+PVD+CVD system to grow complex materials and Powder ALD with rotation furnace
( PE-ALD+CVD) ( PE-ALD+PVD +CVD)
|One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below).
|· Built-in Pfeiffer's pump is ELT Certification
· CE Certified
· All electric components ( >24V) are UL / MET / CSA certified
· The furnace is ready to pass TUV(UL61010) or CSA certification at extra cost.
|· Tube furnaces with quartz tubes are designed for using under vacuum and low pressure < 0.2 bars / 3 psi / 0.02 Mpa
· Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation.
· The flow rate for gasses should be limited to < 200 SCCM (or 200 ml/min) for reducing thermal shocks to the tube
· Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C
|· Using ALD to significant decrease the high solid–solid interfacial impedance between the garnet electrolyte and electrode materials.
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