Tel Number
181-3719-5600
Model:KJ-ALD-1200X
Description:
ALD-1200X is a 4" tube furnace combining with two channel ALD valves and one channel liquid vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film.
Control Pannel | · All parameters of ALD vapor puls time , and Gas flow are controlled by PLC via a 6" touch screen panel in a mobile cart · Control Two ALD valves with puls duation time and cycling with mico-second precision · Control For channels gas delivery with ±0.2%F.S via MFC · Display vacuum pressure · Other parameter upon request of customer · Please click picture below to see control interface ![]() ![]() |
ALD valve![]() |
· Two ALD valves with pulse controller (min 10 ms duration ) · Capable of heating with thermal actuators |
Liquid-Vapor Generator![]() |
· Automatic liquid vapor generator is included and connect to ALD valve |
Dual Zone Split Tube furnace |
· Max 1100ºC for continuous heating · Two programmable precision digital temperature controllers with 30 segments. · Two separate controlled Heating Zones · 200mm length for each heating zone · 400mm total in heating length · 250mm constant central temperature heating area if both zones were heated at the same temperature · 500ºC max temperature difference between two zones with thermal blocks in between · Input power: 208 – 240V AC input, single phase at max. 4KW · Optional: ALD control system can be installed with a short tube furnace or rotation tube furnace as picture below |
Anti-corrosive Pressure Gauge![]() |
· 3.8x10-5 to 1125 Torr measurement range · Anti-corrosive, gas-type independent · High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection · Fast atmospheric detection eliminates waiting time and shortens process cycle · Easy to exchange plug & play sensor element · Click the picture to view detail spec. |
Vacuum Pump ( optional) |
· 10E-2 Torr vacuum can be achieved inside processing tube · Vacuum pump is not included , suggest you order a dry pump for CVD process by click picture below ![]() ![]() |
More Bubbler Optional |
· Click picture below to order bubbler or evaporator for CVD, and below right for Constant temperature control module · Could add Quartz Crystal and thermocouple to monitoring thin film thickness and temperature at extra cost ![]() ![]() |
Update Idea | · You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD and ALD+PVD+CVD system to grow complex materials and Powder ALD with rotation furnace![]() ![]() |
Warranty |
One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below). |
Compliance |
· Built-in Pfeiffer's pump is ELT Certification · CE Certified · All electric components ( >24V) are UL / MET / CSA certified · The furnace is ready to pass TUV(UL61010) or CSA certification at extra cost. |
Application Notes ![]() |
· Tube furnaces with quartz tubes are designed for using under vacuum and low pressure < 0.2 bars / 3 psi / 0.02 Mpa · Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. · The flow rate for gasses should be limited to < 200 SCCM (or 200 ml/min) for reducing thermal shocks to the tube · Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C · |
Application | · Using ALD to significant decrease the high solid–solid interfacial impedance between the garnet electrolyte and electrode materials. |
Tel Number
181-3719-5600
web@kejiafurnace.com
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