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LP/AP CVD system
LP/AP CVD system

LP/AP CVD system

Model:

Description:

The equipment is used in the research industry of thin film preparation, semiconductors, power electronics and other materials, and is suitable for scientific research and teaching in research institutes, colleges and universities.

Detailed
Main application:
    The equipment is used in the research industry of thin film preparation, semiconductors, power electronics and other materials, and is suitable for scientific research and teaching in research institutes, colleges and universities.

Specification:
1. Working temperature: 300-1100°C
2. Tube diameter size: φ60-300
3. Gas flow meter:1-4 channels  Adopt domestic advanced MFC or float flowmeter
4. Optional vacuum pump: optional and customizable;  (1. molecular vacuum pump system 2. rotary vane vacuum pump 3. diffusion vacuum pump system)
5. Touch screen controller optional: 10-15inches
6. Process automation can be realized
7. Can realize automatic feeding and discharging
8. Can be customized, welcome to contact us for more details.

LP/AP CVD system

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E-mail:web@kejiafurnace.com
Tell:+(86) 181-3719-5600
Whatapp:+(86) 180-3717-8440
Address:No.18 Hongye Road,Hi-tech zone,Zhengzhou,China,450000
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181-3719-5600

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web@kejiafurnace.com

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